Announcing Next Generation Scanning XPS Microprobe VersaProbe 4 From Physical Electronics
Physical Electronics, the world’s leading UHV surface analysis instrumentation supplier, announced PHI’s next generation VersaProbe 4 a highly successful multi-technique X-ray photoelectron spectrometer (XPS) that is designed to improve spectroscopic performance, increase productivity and innovation for academic and industrial labs.
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The new PHI VersaProbe 4 has improved spectroscopic performance, new large area imaging and mapping capabilities, and environmentally friendly modern configuration with efficient power consumption, faster pump-down, and ergonomic design.
The fully integrated multi-technique platform of the PHI VersaProbe 4 offers an array of optional excitation sources, sputter ion sources, and sample treatment and transfer capabilities. These features are essential in studying today’s advanced materials and supporting material characterization and problem-solving needs.
PHI VersaProbe 4 delivers several features that researchers need for quality surface analysis, including:
- High sensitivity in small and large area analysis using micro-focused, scanning X-ray source
- Intuitive sample navigation and confident analysis area identification
- NEW X-ray induced Secondary Electron Imaging (SXI) for large-area navigation and large area chemical mapping
- High-Performance depth profiling with multiple ion gun options for a variety of organic, inorganic, and mixed materials
- Suite of specialized solutions for in situ characterization of advanced materials
- Unique full electronic band structure characterization of organic and inorganic materials.
- Advanced software for thin-film structure analysis
- Highly configurable queuing system for automated unattended analysis and maximum efficiency
- Fully remote operation and advanced remote diagnostics
- Efficient power consumption, faster pump-down and ergonomic design
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